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2025-11-26 17:57:49

Advancements in Atomic Layer Deposition (ALD) Equipment and Processes

The Atomic Layer Deposition uses alternating chemical gas pulses to form thin layers of material through surface-level reactions. These reactions are self-controlled, meaning they never create uneven film buildup. This makes ALD extremely reliable for surfaces that have small pores, deep trenches, or unusual shapes. ALD is preferred where consistency matters more than speed. Each ALD cycle...

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